BIO ENG 121 Study Guide - Midterm Guide: Phenol Formaldehyde Resin, San Diego, Bio-Mems
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Berkeley (cid:149) davis (cid:149) irvine (cid:149) los angeles (cid:149) riverside (cid:149) san diego (cid:149) san francisco. Very small beam spot ( < 1nm), can define very small features. Low throughput a serial writing process versusthe parrallel writing process of optical lithography. Proximity effect- backscattered electrons from substrate material may affect critical feature size. Problem #2. (20 points) sacrificial layer process (10 points). Figure 1 show an encapsulated cantilever in the air. Ion beam etching ( ion milling) of psg. Note: this proposed fabrication process is the easiest method to get the desired topology, although, ion beam etching is not a common used method in micro fabrication technology. One other method, is using two different wafers and bond them together to get the desired topology, however this method cost much more than the proposed process flow. In your old laboratory, you have only simple plasma-etching system and chemicals (koh, water, Select which you would use in the following applications.
